Thin film transistors < Thin films < Thin solid films

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List of bibliographic references indexed by Thin films

Number of relevant bibliographic references: 34.
[20-40] [0 - 20][0 - 34]

Ident.	Authors (with country if any)	Title
000964 (2003)	A. Kellou [Algérie] ; N. E. Fenineche [France] ; A. Tadjer [Algérie] ; H. Aourag [Algérie, France]	Ferromagnetic and antiferromagnetic couplings in Cr(0 0 1) thin films and TM monolayer/Cr(0 0 1) (TM = Ti, V, Cr, Mn, Fe, Co, Ni)
000A78 (2001)	K. Lahem [Algérie] ; R. Cherfi [Algérie] ; M. Aoucher [Algérie]	Hydrogen interaction on metal/hydrogenated amorphous silicon Schottky structures: adsorption/desorption effects
000B85 (1999)	M. Da Cunha Belo [Portugal] ; N. E Hakiki [Algérie] ; M. G. S Ferreira [Portugal]	Semiconducting properties of passive films formed on nickel–base alloys type Alloy 600: influence of the alloying elements
000B87 (1999)	J. C. Bernède [France] ; J. Pouzet [France] ; E. Gourmelon [France] ; H. Hadouda [Algérie]	Recent studies on photoconductive thin films of binary compounds
000C67 (1999)	M. Abid [Maroc] ; H. Ouahmane [Maroc] ; H. Lassri [Maroc] ; A. Khmou [Maroc] ; R. Krishnan [France]	Magnetic properties of Ni/V multilayers
000C82 (1998)	R. Mlika [Tunisie, France] ; H. Ben Ouada [Tunisie] ; N. Jaffrezic-Renault [France] ; I. Dumazet [France] ; R. Lamartine [France] ; M. Gamoudi [France] ; G. Guillaud [France]	Study of ion-selective evaporated calixarene film used as a sensitive layer on ISFET sensors
000D10 (1998)	N. Guettari [Algérie] ; J. Ouerfelli [France] ; J. C. Bernède [France] ; A. Khelil [Algérie] ; J. Pouzet [France] ; A. Conan [France]	Photoconductive WSe2 thin films obtained by solid state reaction in the presence of a thin nickel layer
000D29 (1998)	J. Douch [Maroc] ; A. Ait Addi [Maroc] ; M. Hamdani [Maroc]	Films minces de NixCo3-XO4 avec 0 ≤ x ≤ 1 préparés par nébulisation réactive pour l'électrocatalyse. 1- Préparation et analyse physique
000D30 (1998)	J. Ouerfelli [France] ; Z. Jlaïel [France] ; N. Guettari [Algérie] ; E. Gourmelon [France] ; J. Pouzet [France] ; J. C. Bernede [France] ; A. Khelil [Algérie] ; M. Zoater [Liban] ; A. Conan [France]	De la nécessité d'une fine couche de nickel pour obtenir des couches minces de MoSe2 photoconductrices
000D37 (1998)	N. Guettari [Algérie] ; J. Ouerfelli [France] ; J. C. Bernede [France] ; A. Khelil [Algérie] ; J. Pouzet [France] ; A. Conan [France]	Photoconductive WSe2 thin films obtained by solid state reaction in the presence of a thin nickel layer
000D45 (1998)	B. Ghebouli [Algérie] ; A. Layadi [Algérie] ; L. Kerkache [Algérie]	Effect of the substrate on the structural and electrical properties of dc sputtered Ni thin films
000D49 (1998)	A. Guessous [Maroc] ; J. Sarradin ; P. Papet ; K. Elkacemi ; S. Belcadi ; A. Pradel ; M. Ribes	Chemical microsensors based on chalcogenide glasses for the detection of cadmium ions in solution
000D71 (1997)	E. Gourmelon [France] ; H. Hadouda [Algérie] ; Jc Bernede [France] ; J. Pouzet [France]	High quality crystalline MoS2 thin films obtained on Ni coated substrates: optimization of the post-annealing treatment
000E27 (1997)	H. Hadouda [Algérie] ; J. C. Bernede [France] ; E. Gourmelon [France] ; J. Pouzet [France]	Experimental obviousness of the necessity for a thin Ni interfacial layer to obtain highly ordered photoconductive MoS2 films

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